Reverse selectivity - High silicon nitride and low silicon dioxide removal rates using ceria abrasive-based dispersions
Reverse selectivity - High silicon nitride and low silicon dioxide removal rates using ceria abrasive-based dispersions
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DOI：
10.1016/j.jcis.2010.03.071
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发表时间：
2010-07-15
影响因子：
9.9
通讯作者：
Babu, S. V.
中科院分区：
文献类型：
--
作者：
Dandu, P. R. Veera;Devarapalli, V. K.;Babu, S. V.
我们表明，通过将聚（丙烯酸-共-二烯丙基二甲基氯化铵）（一种重均分子量为约4200 g/mol的阳离子聚合物）添加到二氧化铈基分散体中，可以实现>100 nm/min的氮化硅去除速率（RR）和>100 nm/min的二氧化硅RR。
We show that by adding poly(acrylicacid-co-diallyldimethylammonium chloride), a cationic polymer with a weight average molecular weight of about 4200 g/mole, to ceria-based dispersions, it is possible to achieve a silicon nitride removal rate (RR) of >100 nm/min and a silicon dioxide RR of