Improvement of plasma uniformity and mechanical properties of Cr films deposited on the inner surface of a tube by an auxiliary anode near the tube tail
Improvement of plasma uniformity and mechanical properties of Cr films deposited on the inner surface of a tube by an auxiliary anode near the tube tail
复制标题
通过管尾附近的辅助阳极改善管内表面沉积铬膜的等离子体均匀性和机械性能
DOI：
10.1088/2058-6272/ac57fd
复制
发表时间：
2022
影响因子：
1.7
通讯作者：
Luo Peng
中科院分区：
文献类型：
--
作者：
Wu Houpu;Tian Xiubo;Zheng Linlin;Gong Chunzhi;Luo Peng
In order to improve the length of plasma in a whole tube and mechanical properties of Cr films deposited on the inner surface of the tube,a high-power impulse magnetron sputtering coating method with a planar cathode target and auxiliary anode was proposed.The auxiliary anode was placed near the tube tail to attract plasma into the inner part of the tube.Cr films were deposited on the inner wall of a 20 carbon steel tube with a diameter of 40mm and length of 120 mm.The influence of auxiliary anode voltage on the discharge characteristics of the Cr target,and the structure and mechanical properties of Cr films deposited on the inner surface of the tube were explored.With higher auxiliary anode voltage,an increase in substrate current was observed,especially in the tube tail.The thickness uniformity,compactness,hardness and H/E ratios of the Cr films deposited on the inner surface of the tube increased with the increase in auxiliary anode voltage.The Cr films deposited with auxiliary anode voltage of 60V exhibited the highest hardness of 9.6 GPa and the lowest friction coefficient of 0.68.
