A precise vertical X-Y stage with weight compensating mechanism. Friction effects on positioning characteristics.
A precise vertical X-Y stage with weight compensating mechanism. Friction effects on positioning characteristics.
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具有重量补偿机构的精确垂直 X-Y 平台。
DOI：
10.2493/jjspe.54.884
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发表时间：
1988
影响因子：
--
通讯作者：
Toshio Hirokawa
中科院分区：
文献类型：
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作者：
N. Uchida;Yoshihiko Takahashi;Yamada Noboru;Toshio Hirokawa
利用同步轨道辐射，研制了一种用于x射线光刻的垂直X-Y级。水平和垂直移动平台由直线滚珠轴承引导，由直流电机驱动。舞台重量由舞台框架后面的配重来平衡。舞台定位是通过激光干涉仪的闭环控制进行的。得到了以下结果：(1)即使伺服回路增益固定为恒定值，阶跃响应也会随阶跃距离而变化。也就是说，较近的目的地比较远的目的地使响应更稳定。分析证实，这种现象是由滚珠丝杠和导轴承之间的摩擦力引起的。(2)对于25 mm步进运动，控制系统实现了小于±0.03 μm的定位误差和小于1 s的运动时间，并且随着平台接近目标，伺服回路增益增大。
A vertical X-Y stage has been developed for X-ray lithography, using synchrotron orbital radiation. Horizontally and vertically moving stages are guided by linear ball bearings and driven by D.C.motors. Stage weight is counterbalanced by a counter-weight in the back of the stage frame. Stage positionings are carried out by a closed loop control with laser interferometers. The following results have been obtained. (1) Step response varies, depending on the step distance, even if a servo loop gain is fixed to a constant value. That is, a closer destination makes the response more stable than a more distant destination. It has been confirmed by the analysis that the phenomenon is caused by the friction forces at the ball screws and guide bearings. (2) Less than ±0.03 μm positioning error and less than 1 second moving time for a 25 mm step motion have been achieved by the control system, in which the servo loop gain is increased to large values as the stage approaches the destination.