Growth process of nano-tendril bundles with sputtered tungsten
Growth process of nano-tendril bundles with sputtered tungsten
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DOI：
10.1016/j.nme.2019.01.008
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发表时间：
2019-01-01
影响因子：
2.6
通讯作者：
Ohno, Noriyasu
中科院分区：
文献类型：
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作者：
Hwangbo, Dogyun;Kajita, Shin;Ohno, Noriyasu
在溅射为主的直流氦气等离子体中(Ne和N-2)产生了纳米卷须束(NTB)。用试件的净侵蚀产额表征了NTB的形貌。分析了NTBS的高度和面积，讨论了离子注量对NTBS的影响。对于这两种杂质，随着注量的增加，NTB的数量稳步增加。结果表明，无论离子注量多少，NTB都能产生新的、连续的NTB。表面观察表明，微突起可以演化为非关税壁垒。根据扫描电子显微镜的观察结果，讨论了W的再沉积效应。视线沉积似乎是W供给器使非关税壁垒生长更大的关键作用。
Nano-tendril bundles (NTBs) were generated in DC He plasma with impurity gas-seeding (Ne and N-2) under sputtering-dominated conditions. NTB morphologies were characterized using the net erosion yield of samples. NTBs' height and area were analyzed and ion fluence dependence was discussed. For both impurities, the number of NTBs increased steadily with increasing the fluence. It was revealed that NTB can be generated newly and continuously regardless of ion fluence. Surface observations suggested that micro-protrusions can evolve into NTBs. The effect of re-deposition of W was discussed based on SEM observations. Line-of-sight deposition seemed to play a key role of W feeder to enable NTBs to grow greater.