Deposition of Fluorinated Diamond-Like-Carbon Films by Exposure of Electrothermal Pulsed Plasmas
Deposition of Fluorinated Diamond-Like-Carbon Films by Exposure of Electrothermal Pulsed Plasmas
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DOI：
10.1143/jjap.50.08jd04
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发表时间：
2011-08
影响因子：
1.5
通讯作者：
T. Kimura;M. Iida
中科院分区：
文献类型：
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作者：
T. Kimura;M. Iida
通过暴露在脉冲等离子体中，在硅衬底上沉积薄的非晶碳膜，其中原料气体主要来自绝缘体的烧蚀。绝缘子烧蚀采用带放电室的电热脉冲等离子体推进器，绝缘子材料为聚四氟乙烯(PTFE)。脉冲等离子体的电子密度估计在1022-1023m-3数量级，是由电容器中储存的能量产生的。在我们的实验中，沉积速率与存储能量有关，小于1 nm/脉冲。在2.7J左右的储能条件下，用纳米压痕仪测得薄膜的最大硬度约为7 GPA，超过这个值后，薄膜的硬度随储能的增加而降低。拉曼光谱也被用来研究氟化类金刚石碳膜的形成。此外，还研究了稀释气对薄膜性能的影响。
Thin amorphous carbon films are deposited on silicon substrates by exposure to pulsed plasmas where the feed gas is mainly generated from the ablation of an insulator. An electrothermal pulsed plasma thruster with a discharge room in an insulator rod is used as the pulsed plasma for the ablation of the insulator, and the material of the insulator rod is poly(tetrafluoroethylene) (PTFE). The pulsed plasma, in which the estimated electron density is on the order of 1022–1023 m-3, is generated by the stored energy in the capacitor. The deposition rate, which depends on the stored energy, is lower than 1 nm per pulse in our experiment. The maximum hardness measured using a nanoindenter is about 7 GPa at a stored energy of about 2.7 J, beyond which the hardness of the films decreases with the increase in stored energy. Raman spectroscopy is also carried out to examine the formation of fluorinated diamond-like carbon films. In addition, the influence of dilution gas on the properties of the deposited films is also investigated.