Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification
Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification
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DOI：
10.1016/j.mee.2014.05.027
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发表时间：
2014-10
影响因子：
2.3
通讯作者：
Zhiqiang Zhang;H. Duan;Yihui Wu;Zhou Wuping;Liu Cong;T. Yuguo;Li Haiwen
中科院分区：
文献类型：
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作者：
Zhiqiang Zhang;H. Duan;Yihui Wu;Zhou Wuping;Liu Cong;T. Yuguo;Li Haiwen
