Magnetic Properties and Magnetoresistance Effect in Evaporated NiFeCo Films

Magnetic Properties and Magnetoresistance Effect in Evaporated NiFeCo Films
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蒸发 NiFeCo 薄膜的磁性能和磁阻效应

DOI:
10.1109/tjmj.1990.4564282
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发表时间:
1990
期刊:
IEEE Translation Journal on Magnetics in Japan
影响因子:
--
通讯作者:
H. Urai
H. Urai
中科院分区:
--
文献类型:
--
作者:
T. Tatsumi;K. Yamada;Y. Motomura;H. Urai

文献摘要

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研究了(<inf>Ni0.82Fe0.18</inf>)<inf>100-</inf><inf>xCox</inf>和Ni<inf>82</inf> Fe<inf>18</inf>-<inf>xCox</inf>蒸镀薄膜的各向异性磁阻(MR)比和磁各向异性场<inf>(Hk)</inf><inf></inf>的MR比的(Ni<inf>0.82</inf> Fe<inf>0.18</inf>)<inf>100-x</inf>的Co<inf>x</inf>几乎是恒定的,无论在Co浓度的变化。Ni<inf>82</inf> Fe<inf>18-x</inf> Co<inf>x</inf>薄膜的磁电阻率随Co浓度的增加而增加,退火后在Co浓度大于6at%的范围内磁电阻率上升到5%。随着Co浓度的增加,<inf>Hk</inf>增加,并且不被退火改变。Ni<inf>82</inf> Fe<inf>18-</inf> xCox<inf>薄膜</inf>的磁电阻率随退火温度的升高而增大,这与薄膜中的非均匀应变和晶格缺陷有关。Ni<inf>82</inf> Fe<inf>12</inf> Co<inf>6</inf>薄膜的磁电阻率为5.1%,<inf>Hk</inf>为7.0Oe,适合于磁电阻磁头的应用。
The anisotropic magneto-resistance (MR) ratio and magnetic anisotropy field H<inf>k</inf> have been examined for (Ni<inf>0.82</inf>Fe<inf>0.18</inf>)<inf>100-x</inf>Co<inf>x</inf> and Ni<inf>82</inf>Fe<inf>18-x</inf>Co<inf>x</inf> evaporated films, both as-prepared and after annealing at 320°C for two hours, to evaluate their usefulness as MR head materials. The MR ratio of the (Ni<inf>0.82</inf>Fe<inf>0.18</inf>)<inf>100-x</inf>Co<inf>x</inf> is almost constant regardless of changes in the Co concentration. The MR ratio for the Ni<inf>82</inf>Fe<inf>18-x</inf>Co<inf>x</inf> films increases as the Co concentration increases, and after annealing the MR ratio rises up to 5% in the range of Co concentrations above 6 at%. The H<inf>k</inf> increases as the Co concentration is increased, and is not changed by annealing. The increase in the MR ratio for Ni<inf>82</inf>Fe<inf>18-x</inf>Co<inf>x</inf> films due to annealing is related to inhomogeneous strain and lattice defects. For Ni<inf>82</inf>Fe<inf>12</inf>Co<inf>6</inf> film, an MR ratio of 5.1% and an H<inf>k</inf> of 7.0 Oe were obtained, making such film suitable for application in MR heads.