Abrasion resistance of a Nb3Sn magnetron-sputtered coating on copper substrates for radio frequency superconducting cavities

Abrasion resistance of a Nb3Sn magnetron-sputtered coating on copper substrates for radio frequency superconducting cavities
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DOI:
10.1016/j.matdes.2023.112030
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发表时间:
2023-05-30
期刊:
影响因子:
8.4
通讯作者:
Mingo, B.
Mingo, B.
中科院分区:
材料科学1区
文献类型:
--
作者:
Aliasghari, S.;Avcu, E.;Mingo, B.

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本文首次研究了电抛光(EP)或化学抛光(CP)铜基体上磁控溅射Nb3Sn涂层的耐磨性和降解过程。作为本体铌腔的改进,涂层-衬底体系有可能应用于射频超导腔中。采用扫描电镜/能谱仪(SEM/EDS)、电子背散射衍射、x射线衍射和聚焦离子束截面等方法对基体和涂层的微观结构和化学性质进行了表征。在高达200 N的累进载荷下,通过划伤测试研究了涂层的耐磨性,之后用SEM/EDS对划伤表面进行了表征,以确定涂层的失效机制。确定了涂层损伤的几个阶段,包括结核压缩、开裂、点蚀、破碎、粉碎和脱落。然而,大量的碎片和嵌入涂层仍然附着在铜上,直到最高负载。结果表明,EP和CP条件下的耐磨性相似。&副本;2023作者。Elsevier Ltd.出版。这是一篇基于CC BY许可(http://creativecommons.org/licenses/by/4.0/)的开放获取文章。
The paper presents the first study of the abrasion resistance and degradation processes of magnetronsputtered Nb3Sn coatings on electropolished (EP) or chemical polished (CP) copper substrates. The coating-substrate system is of interest for application in radio frequency superconducting cavities as an improvement on bulk niobium cavities. The microstructural and chemical properties of the substrates and coating were examined by scanning electron microscopy/energy dispersive X-ray spectroscopy (SEM/EDS), electron backscatter diffraction, X-ray diffraction, and focused ion beam cross-sectioning. The abrasion resistance was investigated by scratch testing under progressive loads up to 200 N, after which the scratched surfaces were characterised by SEM/EDS to determine the failure mechanisms of the coatings. Several stages of coating damage were identified, including nodule compression, cracking, pitting, fragmentation, comminution and detachment. Nevertheless, substantial amounts of fragmented and embedded coating remained attached to the copper up to the highest load. The findings indicated similar abrasion resistance behaviour for the EP and CP conditions. & COPY; 2023 The Author(s). Published by Elsevier Ltd. This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/).