Lithium ion trapping mechanism of SiO2 in LiCoO2 based memristors
Lithium ion trapping mechanism of SiO2 in LiCoO2 based memristors
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DOI:
10.1038/s41598-019-41508-3
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发表时间:
2019-03
影响因子:
4.6
通讯作者:
Qi Hu;Runmiao Li;Xinjiang Zhang;Qin Gao;Mei Wang;Hongliang Shi;Zhisong Xiao;P. Chu;A. Huang
中科院分区:
文献类型:
--
作者:
Qi Hu;Runmiao Li;Xinjiang Zhang;Qin Gao;Mei Wang;Hongliang Shi;Zhisong Xiao;P. Chu;A. Huang
Pt/LiCoO2/SiO2/Si stacks with different SiO2thicknesses are fabricated and the influence of SiO2on memristive behavior is investigated. It is demonstrated that SiO2can serve as Li ion trapping layer benefiting device retention, and the thickness of SiO2must be controlled to avoid large SET voltage and state instability. Simulation model based on Nernst potential and diffusion potential is postulated for electromotive force in LiCoO2based memristors. The simulation results show that SiO2trapping layer decreases the total electromotive field of device and thereby prevents Li ions from migrating back to LiCoO2. This model shows a good agreement with experimental data and reveals the Li ion trapping mechanism of SiO2in LiCoO2based memristors.