Ion beam-induced positive imaging of polyimide via two step imidization
Ion beam-induced positive imaging of polyimide via two step imidization
复制标题
通过两步亚胺化对聚酰亚胺进行离子束诱导正成像
DOI：
10.1016/s0032-3861(03)00051-x
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发表时间：
2003
期刊：
影响因子：
4.6
通讯作者：
N. Yonezawa
中科院分区：
文献类型：
--
作者：
Y. Maekawa;Yasuyuki Suzuki;Masaru Yoshida;K. Maeyama;N. Yonezawa
热稳定聚酰亚胺薄膜的离子径迹膜的制备是通过对部分酰亚胺化的聚酰胺酸（PAA）薄膜进行离子束照射，然后进行碱性蚀刻和最终酰亚胺化来进行的。尽管已知磺酰基对离子束高度敏感，但在含有磺酰基键的部分酰亚胺化 PAA 的辐照膜上没有观察到可辨别的正孔图案。相比之下，酰亚胺化度为 68-89% 的部分酰亚胺化 PAA 的辐照膜上出现正孔图案，其主链中含有磺酰基键和亚甲基。在89%酰亚胺化度的辐照PAA薄膜上观察到最鲜明的直径为0.3μm的孔图案。然后将经过辐照的带有孔图案的PAA膜在350℃下固化1小时转化为相应的聚酰亚胺膜。通过聚酰亚胺的结构比较，提出了孔图案形成的可能机制。
The preparation of ion track membranes of thermally stable polyimide films has been performed by ion beam irradiation of partially imidized polyamic acid (PAA) films followed by alkaline etching and final imidization. No discernible positive hole patterns were observed on the irradiated films of partially imidized PAA containing sulfonyl linkages, although sulfonyl group is known to be highly sensitive to ion beams. In contrast, positive hole patterns appeared on the irradiated films of the partially imidized PAA with 68–89% imidization degrees that contains sulfonyl linkages along with a methylene group in the main chain. The most contrasty hole patterns with 0.3μm diameter were observed on the irradiated PAA films of 89% imidization degree. The irradiated PAA film with the hole patterns was then transformed to the corresponding polyimide film with curing at 350°C for 1h. From the structural comparison of the polyimides, the possible mechanism for the hole pattern formation is suggested.