Cephalometrics for orthognathic surgery.
Cephalometrics for orthognathic surgery.
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用于正颌手术的头影测量。
DOI：
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发表时间：
1978
期刊：
影响因子：
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通讯作者：
Norton La
中科院分区：
文献类型：
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作者：
Burstone Cj;James Rb;H. Legan;Murphy Ga;Norton La
一个头影测量分析，特别是设计的病人谁需要颌面部手术的开发使用的标志和测量，可以改变常见的外科手术。由于测量主要是线性的，它们可以很容易地应用于预测覆盖和研究铸件安装，并可作为评价后处理稳定性的基础。
A cephalometric analysis especially designed for the patient who requires maxillofacial surgery was developed to use landmarks and measurements that can be altered by common surgical procedures. Because measurements are primarily linear, they may be readily applied to prediction overlays and study cast mountings and may serve as a basis for the evaluation of posttreatment stability.