SCALING OF THE DROPLET-SIZE DISTRIBUTION IN VAPOR-DEPOSITED THIN-FILMS
SCALING OF THE DROPLET-SIZE DISTRIBUTION IN VAPOR-DEPOSITED THIN-FILMS
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DOI:
10.1103/physrevlett.61.428
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发表时间:
1988-07-25
影响因子:
8.6
通讯作者:
MEAKIN, P
中科院分区:
文献类型:
--
作者:
FAMILY, F;MEAKIN, P
A dynamic-scaling approach is developed for the description of the droplet-size distribution in vapor-deposited thin films and processes where droplets are formed by nucleation, growth, and coalescence of the droplets. The exponent describing the scaling of the droplet-size distribution and the growth law for the mean droplet size are calculated exactly. A realistic, yet simple, droplet-growth model is developed. The simulation data are found to be consistent with the experiments on vapor-deposited tin and with the theoretical predictions in d= 1, 2, and 3.