Nanolayer barriers for inhibition of copper corrosion
Nanolayer barriers for inhibition of copper corrosion
复制标题
抑制铜腐蚀的纳米层屏障
DOI：
--
复制
发表时间：
2004
期刊：
影响因子：
--
通讯作者：
Erika Kálmán
中科院分区：
文献类型：
--
作者：
J. Telegdi;T. Rigó;Erika Kálmán
在酸性和中性氯化钠和硫酸钠溶液中研究了烷基羟肟酸保护纳米层作为Langmuir-Blodgett膜（LB）或自组装分子层（SAM）沉积在铜表面。通过表面可视化技术和接触角测量，在铜衬底上沉积LB膜并形成SAM。暴露于腐蚀性电解质后，通过图像分析、铜表面粗糙度和电化学方法表征了单层和多层的防腐能力。
Protective nanolayers of alkyl hydroxamic acids deposited on a copper surface as a Langmuir-Blodgett film (LB) or as a self assembled molecular layer (SAM) were studied in acidic and neutral sodium chloride and sodium sulphate solutions. The LB film deposition and SAM formation on copper substrate were followed by a surface visualisation technique and by contact angle measurement. Following exposure to aggressive electrolytes the anticorrosion abilities of the monolayers and multilayers were characterised by image analysis, by the roughness of the copper surface, and by an electrochemical method.