Two-Step Forming Process in Planar-Type Cu_2O-Based Resistive Switching Device
Two-Step Forming Process in Planar-Type Cu_2O-Based Resistive Switching Device
复制标题
平面型Cu_2O基阻变器件的两步成型工艺
DOI:
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发表时间:
2011
影响因子:
2.3
通讯作者:
K.Suzuki
中科院分区:
文献类型:
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作者:
Y. Shiraishi;M. Hashimura;M. Nakao;T. Ishizu Y. Miyamoto and N. Toshima;K.Suzuki