The dependence of structural and mechanical properties on film thickness in sol-gel zirconia films

The dependence of structural and mechanical properties on film thickness in sol-gel zirconia films
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DOI:
10.1557/jmr.1998.0051
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发表时间:
1998-02
影响因子:
2.7
通讯作者:
M. J. Paterson;P. Paterson;B. Ben-Nissan
M. J. Paterson;P. Paterson;B. Ben-Nissan
中科院分区:
材料科学4区
文献类型:
--
作者:
M. J. Paterson;P. Paterson;B. Ben-Nissan

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The structure, morphology, and mechanical properties of sol-gel zirconia films have been examined using XRD, AES depth profiling, AFM, and ultramicro indentation. There is a systematic variation in the structure and morphology of the zirconia films with increasing thickness. These changes include increases in the amount of monoclinic phase, substrate oxides, and a decrease in grain size. Ultramicro indentation measurements indicate measured hardness increases with film thickness. The highest hardness value was 6.12 GPa for a 900 nm thick film. However, these values may be influenced by the substrate oxide layer at the film/substrate interface which increases with film thickness. The modulus of the films appears to be thickness independent. As the films are made up of a number of separately fired layers, it appears that the property changes observed are also related to the number of thermal cycles experienced by the sample.