Effect of NiOx thin layer fabricated by oxygen-plasma treatment on polymer photovoltaic cell
Effect of NiOx thin layer fabricated by oxygen-plasma treatment on polymer photovoltaic cell
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DOI:
10.1016/j.solmat.2010.04.077
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发表时间:
2010-10
影响因子:
6.9
通讯作者:
Zhen Wang;Su-Hwan Lee;D. Kim;Ji-heon Kim;Jea‐Gun Park
中科院分区:
文献类型:
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作者:
Zhen Wang;Su-Hwan Lee;D. Kim;Ji-heon Kim;Jea‐Gun Park
The performance of polymer photovoltaic (PV) cells based on poly(3-hexylthiophene-2,5-diyl) (P3HT) and [6,6]-phenyl-C61 butyric-acid methyl-ester (PCBM) bulk heterojunctions with an NiOxanode buffer layer was investigated. NiOxlayers with various thicknesses (i.e., without a layer, 0.5, 1, 2, and 5nm), were fabricated by oxygen plasma treatment on an evaporated metallic Ni layer under 200W and 100sccm for 200s. The power conversion efficiency (PCE) of the polymer PV cell exhibited a similar trend to the short-circuit current density (Jsc) and fill factor (FF) but not to open circuit voltage (Voc) for various NiOxthicknesses. This tendency is associated with the fact that the light absorption and series resistance of the polymer PV cell depends on the thickness of the NiOxlayer. The PCE of the cell with the optimized 1-nm-thick NiOxlayer was improved by 68.5% compared to that of the cell without an NiOxlayer. With a combination of different techniques of analysis, such as Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS), the fabricated NiOxlayer was studied in detail. The NiOxlayer between the ITO anode and active layer strongly influenced the PCE of polymer PV cells, which was accounted for by hole-injection and electron-blocking properties.