Influence of femtosecond laser pulse energy on the surface reflection of black silicon in alkaline solution
Influence of femtosecond laser pulse energy on the surface reflection of black silicon in alkaline solution
复制标题
飞秒激光脉冲能量对碱性溶液中黑硅表面反射的影响
DOI：
10.2351/1.4935196
复制
发表时间：
2016-02-01
影响因子：
2.1
通讯作者：
Liu, Shibing
中科院分区：
文献类型：
--
作者：
Meng, Jiao;Song, Haiying;Liu, Shibing
提出了一种降低黑硅表面反射的高效方法，即在碱性溶液中用飞秒激光辐照制备黑硅。在黑硅表面形成了丛林状的微结构。与抛光硅相比，黑硅可以显著抑制表面反射。在整个可见光区域，黑化表面的平均最小反射率约为5.6%。同时，为了得到最佳的激光能量，我们研究了硅表面的演化作为入射脉冲能量的函数。综合考虑丛林状微结构的高度和黑硅样品的反射率，最佳激光能量为1400 μJ。通过选择合适的激光能量，可以制备出高吸收的黑硅。这些结果对控制表面形貌和材料表面改性具有重要意义。
A highly efficient approach for reducing the reflection of the black silicon surface is demonstrated, in which the black silicon is fabricated in alkaline solution via a femtosecond laser irradiation. The junglelike microstructures are formed on the surface of the black silicon. Compared to the polished silicon, the black silicon can significantly suppress the surface reflection. Throughout the region of visible light, the average minimum reflectance of the blackened surface is about 5.6%. Meanwhile, in order to get an optimal laser energy, we investigated the evolution on silicon surface as a function of incident pulse energy. Taking into account the height of junglelike microstructures and the reflectance of black silicon samples, the optimal laser energy is 1400 μJ. By choosing the right laser energy, it is possible to fabricate the highly absorptive black silicon. These results are of extreme importance in the control of surface morphology and the modification of material surface.