Precise XPS depth profile of soda-lime-silica glass using C60 ion beam
Precise XPS depth profile of soda-lime-silica glass using C60 ion beam
复制标题
使用 C60 离子束对钠钙硅玻璃进行精确的 XPS 深度剖面分析
DOI：
10.1016/j.jnoncrysol.2009.09.027
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发表时间：
2010
影响因子：
3.5
通讯作者：
Kiyoshi Yamamoto
中科院分区：
文献类型：
--
作者：
Y. Yamamoto;Kiyoshi Yamamoto
氩离子溅射是实际 X 射线光电子能谱 (XPS) 分析中最受接受的深度剖析技术之一，但众所周知，该技术不足以对包括移动离子（例如钠钙硅玻璃）的玻璃进行定量分析。为了在 XPS 深度分析中进行精确的深度分析，研究了三种方法来抑制玻璃中移动离子的迁移：(i) 在玻璃表面涂覆导电薄膜、(ii) 在 -130°C 温度下冷却样品和 (iii) 巴克明斯特富勒烯 (C60) 离子溅射。据我们所知，这是首次利用C60离子溅射成功地对钠钙硅玻璃（70.4SiO2、0.9Al2O3、7.3MgO、7.8CaO、13.6Na2O，mol%）进行精确XPS深度分析，且成分不发生变化。精确分析表明，Ar离子溅射过程中的离子注入主要由于移动离子的迁移而导致成分变化。
Ar ion sputtering is one of the most accepted techniques for depth profiling in practical X-ray photoelectron spectroscopy (XPS) analysis, while this technique is known to be inadequate for quantitative analysis of glass including mobile ions such as soda-lime-silica glass. For the precise depth profiling on XPS depth analysis, three methods, (i) coating of conductive thin film on glass surface, (ii) sample cooling at the temperature of −130°C and (iii) buckminsterfullerene (C60) ion sputtering, were investigated to suppress the migration of mobile ions in glass. In our best knowledge, it is the first time to succeed the precise XPS depth analysis of soda-lime-silica glass (70.4SiO2, 0.9Al2O3, 7.3MgO, 7.8CaO, 13.6Na2O in mol%) without compositional change by using C60ion sputtering. The precise analysis revealed that the ion implantation during Ar ion sputtering principally resulted in the compositional change due to the migration of mobile ions.