Voids formed in quenched and annealed NiAl

Voids formed in quenched and annealed NiAl
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淬火和退火 NiAl 中形成的空隙

DOI:
10.1080/01418617808239252
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发表时间:
1978
期刊:
影响因子:
--
通讯作者:
C. Ortiz
C. Ortiz
中科院分区:
--
文献类型:
--
作者:
J. E. Epperson;K. Gerstenberg;D. Berner;G. Kostorz;C. Ortiz

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摘要用中子小角散射和透射电子显微镜研究了化学计量比NiAl单晶在急冷和退火过程中形成的空洞。已经观察到平均尺寸高达约1000 A的空隙。例如,在从1600°C淬火之后在650°C下退火30分钟产生直径约500 A的刻面空隙。空洞是由{110}面族上的刻面形成的菱形十二面体。在约900°C的中间退火温度下有一些粗化的迹象,但在1300°C及以上,空洞消失,可能是由于空位的排放。
Abstract Voids formed in quenched and annealed stoichiometrie NiAl single crystals have been investigated by neutron small-angle scattering and transmission electron microscopy. Voids ranging in mean size up to about 1000 A have been observed. For example, 30 min annealing at 650°C after quenching from 1600°C yields faceted voids about 500 A in diameter. The voids are found to be rhombic dodecahedra formed by faceting on the {110} family of planes. There is some indication of coarsening at intermediate annealing temperatures of about 900°C, but at 1300°C and above, the voids disappear, presumably by emission of vacancies.