CMOS-compatible highly efficient polarization splitter and rotator based on a double-etched directional coupler
CMOS-compatible highly efficient polarization splitter and rotator based on a double-etched directional coupler
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DOI:
10.1364/oe.22.002489
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发表时间:
2014-02-10
期刊:
影响因子:
3.8
通讯作者:
Hochberg, Michael
中科院分区:
文献类型:
--
作者:
Guan, Hang;Novack, Ari;Hochberg, Michael
We present a highly efficient polarization splitter and rotator (PSR), fabricated using 248 nm deep ultraviolet lithography on a silicon-on-insulator substrate. The PSR is based on a double-etched directional coupler with a length of 27 mu m. The fabricated PSR yields a TM-to-TE conversion loss better than 0.5 dB and TE insertion loss better than 0.3 dB, with an ultra-low crosstalk (-20 dB) in the wavelength regime 1540-1570 nm. (C) 2014 Optical Society of America