VOLATILES IN SILICATE MELTS AT HIGH-PRESSURE AND TEMPERATURE .2. WATER IN MELTS ALONG THE JOIN NAALO2-SIO2 AND A COMPARISON OF SOLUBILITY MECHANISMS OF WATER AND FLUORINE
VOLATILES IN SILICATE MELTS AT HIGH-PRESSURE AND TEMPERATURE .2. WATER IN MELTS ALONG THE JOIN NAALO2-SIO2 AND A COMPARISON OF SOLUBILITY MECHANISMS OF WATER AND FLUORINE
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DOI:
10.1016/0009-2541(86)90057-4
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发表时间:
1986-12-30
期刊:
影响因子:
3.9
通讯作者:
VIRGO, D
中科院分区:
文献类型:
--
作者:
MYSEN, BO;VIRGO, D
The structure of silicate melts on the joins SiO2H2O, SiO2Al(OH)3, SiO2Ca(OH)2and SiO2NaOH at high pressure and temperature has been determined with Raman spectroscopy (quenched from 1550°C at ∼ 500°C s−1at 15 kbar). In SiO2H2O and SiO2Al(OH)3melt compositions, H2O exists as molecular H2O ((H2O)0) and as OH bonded to Si4+in the water concentration range between 4 and 10 wt.%. In SiO2Al(OH)3composition melts, OH groups are also attached to Al3+. In the systems SiO2Ca(OH)2and SiO2NaOH, water is dissolved as sodium and calcium hydroxyl complexes in addition to molecular water. Hydroxylation of the silica tetrahedra was not observed in quenched melts along the latter two joins. On the basis of calculated free energies of hydroxylation, the relative stabilities of the hydroxyl complexes are Si … OH > Na … OH > Al … OH > Ca … OH. Nonbridging oxygen is observed in all but SiO2H2O melts. In all systems, intensity relationships among the relevant Raman bands show increasing abundance of metal hydroxyl complexes, nonbridging oxygen and H2O with increasing water content.