VOLATILES IN SILICATE MELTS AT HIGH-PRESSURE AND TEMPERATURE .2. WATER IN MELTS ALONG THE JOIN NAALO2-SIO2 AND A COMPARISON OF SOLUBILITY MECHANISMS OF WATER AND FLUORINE

VOLATILES IN SILICATE MELTS AT HIGH-PRESSURE AND TEMPERATURE .2. WATER IN MELTS ALONG THE JOIN NAALO2-SIO2 AND A COMPARISON OF SOLUBILITY MECHANISMS OF WATER AND FLUORINE
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DOI:
10.1016/0009-2541(86)90057-4
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发表时间:
1986-12-30
期刊:
影响因子:
3.9
通讯作者:
VIRGO, D
VIRGO, D
中科院分区:
地球科学2区
文献类型:
--
作者:
MYSEN, BO;VIRGO, D

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在高压和高温下,硅酸盐熔体在 SiO2H2O、SiO2Al(OH)3、SiO2Ca(OH)2 和 SiO2NaOH 连接处的结构已通过拉曼光谱(在 15 kbar 下从 1550°C 至 500°C s−1 淬火)确定。在SiO2H2O和SiO2Al(OH)3熔体组合物中,H2O以分子H2O((H2O)0)和与Si4+键合的OH形式存在,水浓度在4至10wt.%之间。在SiO2Al(OH)3组合熔体中,OH基团也连接到Al3+上。在SiO2Ca(OH)2和SiO2NaOH体系中,除了分子水之外,水还以钠和钙羟基络合物的形式溶解。在沿着后两个接合处的淬火熔体中没有观察到二氧化硅四面体的羟基化。根据计算的羟基化自由能,羟基配合物的相对稳定性为 Si … OH > Na … OH > Al … OH > Ca … OH。除 SiO2H2O 熔体外,在所有熔体中均观察到非桥氧。在所有系统中,相关拉曼谱带之间的强度关系表明,随着水含量的增加,金属羟基络合物、非桥接氧和水的丰度不断增加。
The structure of silicate melts on the joins SiO2H2O, SiO2Al(OH)3, SiO2Ca(OH)2and SiO2NaOH at high pressure and temperature has been determined with Raman spectroscopy (quenched from 1550°C at ∼ 500°C s−1at 15 kbar). In SiO2H2O and SiO2Al(OH)3melt compositions, H2O exists as molecular H2O ((H2O)0) and as OH bonded to Si4+in the water concentration range between 4 and 10 wt.%. In SiO2Al(OH)3composition melts, OH groups are also attached to Al3+. In the systems SiO2Ca(OH)2and SiO2NaOH, water is dissolved as sodium and calcium hydroxyl complexes in addition to molecular water. Hydroxylation of the silica tetrahedra was not observed in quenched melts along the latter two joins. On the basis of calculated free energies of hydroxylation, the relative stabilities of the hydroxyl complexes are Si … OH > Na … OH > Al … OH > Ca … OH. Nonbridging oxygen is observed in all but SiO2H2O melts. In all systems, intensity relationships among the relevant Raman bands show increasing abundance of metal hydroxyl complexes, nonbridging oxygen and H2O with increasing water content.