Silicon-content-dependent microstructures and mechanical behavior of (AlCrTiZrMo)-Six-N high-entropy alloy nitride films
Silicon-content-dependent microstructures and mechanical behavior of (AlCrTiZrMo)-Six-N high-entropy alloy nitride films
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DOI：
10.1016/j.matdes.2021.109553
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发表时间：
2021-02
影响因子：
8.4
通讯作者：
Wang Yu;Wei Li;Ping Liu;Ke Zhang;Fengcang Ma;Xiaohong Chen;R. Feng;P. Liaw
中科院分区：
文献类型：
--
作者：
Wang Yu;Wei Li;Ping Liu;Ke Zhang;Fengcang Ma;Xiaohong Chen;R. Feng;P. Liaw
采用磁控溅射法在硅基片上制备了不同硅含量的多元（AlCrTiZrMo）-Six-N高熵薄膜。采用X射线衍射（XRD）、扫描电镜（SEM）、高分辨透射电镜（HRTEM）、电子探针（EPMA）和纳米压痕等测试手段研究了硅含量对薄膜结构和性能的影响。结果表明，无硅的（AlCrTiZrMo）N薄膜具有柱状晶和（200）择优取向。随着硅含量的增加，薄膜逐渐从具有（200）择优取向的柱状晶粒转变为具有非晶相（非晶相是固态中原子排列的近有序和长无序的状态）的结构，所述非晶相包含具有更细晶粒的纳米晶体（纳米晶体是尺寸为5-10 nm的单相（AlCrTiZrMo）N晶粒）。随着硅含量的增加，薄膜的力学性能先增大后减小。因此，当硅含量为4.5原子百分比（at.%）时，所得薄膜具有综合力学性能，最大硬度和模量分别为28.5GPa和325.4GPa。结果表明，薄膜的显微结构是薄膜硬度和模量提高的主要原因。
The multi-component (AlCrTiZrMo)-Six-N high-entropy films with different silicon contents were deposited on the silicon substrate by magnetron sputtering. The influence of silicon contents on the structures and properties of the films was studied by means of X-ray diffraction (XRD), scanning electron microscopy (SEM), high-resolution transmission electron microscopy (HRTEM), electron probe microanalyzer (EPMA) and nanoindentation. The results show that the (AlCrTiZrMo)N film without silicon has columnar crystals and the (200)-preferred direction. With the increase of the silicon content, the films gradually change from columnar grains with a (200) preferential orientation to structures with amorphous phases (amorphous phases are the state of near order and long disorder in the arrangement of atoms in a solid state) containing nanocrystals (nanocrystallites are single-phase (AlCrTiZrMo)N of grains with a size of 5–10 nm) with finer grains. As the silicon content increases, the mechanical properties of the films first increase then decrease. Thus, when the silicon content is 4.5 atomic percent (at.%), the film obtained possessed comprehensive mechanical properties with the maximum hardness and modulus values of 28.5 GPa and 325.4 GPa, respectively. The results show that the improvement of hardness and modulus is mainly attributed to the microstructures of the films.