Admittance–voltage profiling of AlxGa1−xN/GaN heterostructures: Frequency dependence of capacitance and conductance
Admittance–voltage profiling of AlxGa1−xN/GaN heterostructures: Frequency dependence of capacitance and conductance
复制标题
AlxGa1−xN/GaN 异质结构的导纳电压分析:电容和电导的频率依赖性
DOI:
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发表时间:
2015
期刊:
影响因子:
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通讯作者:
O. Ambacher
中科院分区:
文献类型:
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作者:
K. Köhler;W. Pletschen;B. Godejohann;S. Müller;H. Menner;O. Ambacher
Admittance–voltage profiling of AlxGa1−xN/GaN heterostructures was used to determine the frequency dependent capacitance and conductance of FET devices in the frequency range from 50 Hz to 1 MHz. The nominally undoped low pressure metal-organic vapor-phase epitaxy structures were grown with an Al-content of 30%. An additional 1 nm thick AlN interlayer was placed in one structure before the Al0.3Ga0.7N layer growth. For frequencies below 108 Hz it is convenient to use equivalent circuits to represent electric or dielectric properties of a material, a method widely used, for example, in impedance spectroscopy. We want to emphasize the relation between frequency dependent admittance–voltage profiling and the corresponding equivalent circuits to the complex dielectric function. Debye and Drude models are used for the description of the frequency dependent admittance profiles in a range of depletion onset of the two-dimensional electron gas. Capacitance- and conductance-frequency profiles are fitted in the ent...