Microfabrication of fine electron beam tunnels using UV-LIGA and embedded polymer monofilaments for vacuum electron devices
Microfabrication of fine electron beam tunnels using UV-LIGA and embedded polymer monofilaments for vacuum electron devices
复制标题
DOI：
10.1088/0960-1317/22/1/015010
复制
发表时间：
2012-01-01
影响因子：
2.3
通讯作者：
Garven, Morag
中科院分区：
文献类型：
--
作者：
Joye, Colin D.;Calame, Jeffrey P.;Garven, Morag
真空电子器件需要电子束通过中空通道传输，该中空通道穿过电磁慢波电路。随着工作频率向太赫兹方向推进，这些电子束隧道的尺寸正在缩小，小于传统技术所能控制的尺寸。一种新的技术描述和实验证明，使用任意截面形状的聚合物单丝结合紫外光刻（UV-LIGA）的SU-8光刻胶。这种单丝和SU-8结构的组合包括一个3D模具，在该模具周围电铸铜，以产生任意长度和尺寸的高质量光束隧道沿着电磁电路。真正的圆形束隧道需要上毫米波和太赫兹真空电子器件现在可以在一个单一的UV-LIGA步骤制造。这些技术也与微流体装置和其他需要具有几百或更大纵横比的非常小的直通道的应用相关。
Vacuum electron devices require electron beams to be transported through hollow channels that pass through an electromagnetic slow-wave circuit. These electron 'beam tunnels' are shrinking toward sizes smaller than traditional techniques can manage as the operating frequencies push toward the THz. A novel technique is described and experimentally demonstrated that uses polymer monofilaments of arbitrary cross-sectional shape combined with ultraviolet photolithography (UV-LIGA) of SU-8 photoresists. This combination of monofilaments and SU-8 structures comprises a 3D mold around which copper is electroformed to produce high-quality beam tunnels of arbitrary length and size along with the electromagnetic circuits. True round beam tunnels needed for upper-millimeter wave and THz vacuum electron devices can now be fabricated in a single UV-LIGA step. These techniques are also relevant to microfluidic devices and other applications requiring very small, straight channels with aspect ratios of several hundred or more.