The effect of relative plasma plume delay on the properties of complex oxide films grown by multi-laser, multi-target combinatorial pulsed laser deposition
The effect of relative plasma plume delay on the properties of complex oxide films grown by multi-laser, multi-target combinatorial pulsed laser deposition
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DOI：
10.1016/j.apsusc.2009.06.106
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发表时间：
2009-08
影响因子：
6.7
通讯作者：
K. Sloyan;T. May-Smith;R. Eason;J. Lunney
中科院分区：
文献类型：
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作者：
K. Sloyan;T. May-Smith;R. Eason;J. Lunney
报道了等离子体羽流的相对时延对双光束组合脉冲激光沉积石榴石晶体薄膜的影响。相对羽流延迟对Gd3Ga5O12(GGG)和Gd3Sc2Ga3O12(GSGG)混合薄膜的晶格常数和元素组成均有影响。使用朗缪尔探测器对等离子体进行了进一步的分析，发现对于小于∼200μS的相对羽流延迟，第二个羽流通过第一个羽流产生的部分真空，导致更高能量的离子轰击生长的薄膜。得到的面内应力与在该延迟值附近观察到的垂直于薄膜平面的较高晶格常数值的转变是一致的。在比∼10μS更短的延迟下，发现羽流传播重叠，导致羽流中较轻的离子散射，并改变了生成的薄膜的化学计量比。
We report the effects of relative time delay of plasma plumes on thin garnet crystal films fabricated by dual-beam, combinatorial pulsed laser deposition. Relative plume delay was found to affect both the lattice constant and elemental composition of mixed Gd3Ga5O12(GGG) and Gd3Sc2Ga3O12(GSGG) films. Further analysis of the plasmas was undertaken using a Langmuir probe, which revealed that for relative plume delays shorter than ∼200μs, the second plume travels through a partial vacuum created by the first plume, leading to higher energy ion bombardment of the growing film. The resulting in-plane stresses are consistent with the transition to a higher value of lattice constant normal to the film plane that was observed around this delay value. At delays shorter than ∼10μs, plume propagation was found to overlap, leading to scattering of lighter ions from the plume and a change in stoichiometry of the resultant films.