Phototriggered Acid Proliferation to Enhance Photosensitivity of Chemically Amplified Photoresists
Phototriggered Acid Proliferation to Enhance Photosensitivity of Chemically Amplified Photoresists
复制标题
光触发酸扩散增强化学放大光刻胶的光敏性
DOI：
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发表时间：
2001
期刊：
影响因子：
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通讯作者：
K. Ichimura
中科院分区：
文献类型：
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作者：
K. Arimitsu;K. Ichimura
针对光触发酸增殖反应产生光生酸的问题，合成了1-苯基-3-甲苯磺酰氧基-1-丙酮的1-(邻硝基苯基(乙烯缩酮)(1)。1经光化学脱保护生成甲苯磺酸2-苯甲酰乙酯，释放磺酸，热引发1自催化分解，促进酸增殖反应。缩酮1被证明是第一个光不稳定酸放大器充当光酸生成的增强剂1与酸不稳定聚合物的组合提供了正性化学放大光致抗蚀剂，表明1在聚合物膜中充当光酸产生剂。
Aiming at the development of phototriggered acid proliferatin reactions to breed photogenerated acids, 1-(o-nitrophenyl(ethylene ketal of 1-phenyl-3-tosyloxy-1-propanone (1) was synthesized. 1 was deprotected photochemically to 2-benzoylethyl tosylate to release the sulfonic acid to thermally initiate the autocatalytic decomposition of 1 to advance the acid proliferation reaction. The ketal 1 was proven to be the first photolabile acid amplifier to act as an enhancer for the generation of a photo-acid. The combination of 1 with an acid-labile polymer provided a positive-working chemically amplified photo-resist, indicating that 1 acts as a photoacid generator in a polymer film.