Holographic fabrication of an arrayed one-axis scale grating for a two-probe optical linear encoder.
Holographic fabrication of an arrayed one-axis scale grating for a two-probe optical linear encoder.
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DOI：
10.1364/oe.25.016028
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发表时间：
2017-07
期刊：
影响因子：
3.8
通讯作者：
Xinghui Li;Qian Zhou;Xiangwen Zhu;Haiou Lu;L. Yang;Donghan Ma;Jianhui Sun;K. Ni;Xiaohao Wang-Xi
中科院分区：
文献类型：
--
作者：
Xinghui Li;Qian Zhou;Xiangwen Zhu;Haiou Lu;L. Yang;Donghan Ma;Jianhui Sun;K. Ni;Xiaohao Wang-Xi
提出了一种利用双光束干涉光刻系统和紧凑型半导体激光光源制作双探针光学线性编码器阵列单轴光栅的方法。我们采用多重曝光拼接的方法来形成一个阵列化的刻度光栅。这允许在大宽度上实现具有小线间距的标度光栅。这种拼接光栅与新开发的双探头光学编码器集成良好，使测量结果能够数字连接。由于两个相邻光栅的差距宽度和光栅相位都不必控制，因此制造过程既简化又更加鲁棒。这种灵活且具有成本效益的制造技术可以使许多精密测量应用受益。实验证明了该技术的可行性。
We present a method for the fabrication of an arrayed one-axis scale grating for a two-probe optical linear encoder using a dual-beam interference lithography (IL) system with a compact diode laser source. We employ a multiple-exposure stitching method to form an arrayed scale grating. This allows a scale grating with small line spacing to be achieved over a large width. This stitched scale grating integrates well with a newly developed two-probe optical encoder, allowing the measurement results to be numerically connected. Since neither the gap width nor the grating phase of the two adjacent gratings must be controlled, the fabrication process is both simplified and made more robust. This flexible and cost-effective fabrication technique can benefit many precision measurement applications. Experiments are carried out to demonstrate the feasibility of this technology.