Correlation of Giant Magnetoresistance with Interfacial Roughness in Co/Cu Superlattices
Correlation of Giant Magnetoresistance with Interfacial Roughness in Co/Cu Superlattices
复制标题
Co/Cu超晶格中巨磁阻与界面粗糙度的相关性
DOI：
10.1143/jjap.33.6173
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发表时间：
1994
影响因子：
1.5
通讯作者：
Masaki Yamamoto Masaki Yamamoto
中科院分区：
文献类型：
--
作者：
H. Ueda;O. Kitakami;Y. Shimada;Yoshinori Goto Yoshinori Goto;Masaki Yamamoto Masaki Yamamoto
通过改变溅射方法、溅射气压和退火温度，研究了Co/Cu超晶格的界面结构与磁电阻之间的关系。X射线衍射（XRD）实验表明，从低角度XRD谱确定的均方根粗糙度是一个很好的措施来评估的界面粗糙度，决定反铁磁耦合区的面积占用和磁阻比。
We investigate the relationship between the magnetoresistance and the interfacial roughness of Co/Cu superlattices whose interface structures are varied by changing sputtering methods, varying sputtering gas pressure and annealing temperatures. X-ray diffraction (XRD) experiments have revealed that the root mean square roughness determined from low-angle XRD spectra is a good measure to evaluate the interfacial roughness which determines the areal occupation of antiferromagnetically coupled regions and the magnetoresistance ratio.