Compact snapshot dual-mode interferometric system for on-machine measurement

Compact snapshot dual-mode interferometric system for on-machine measurement
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用于机上测量的紧凑型快照双模干涉系统

DOI:
10.1016/j.optlaseng.2020.106129
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发表时间:
2020
影响因子:
4.6
通讯作者:
Liang Rongguang
Liang Rongguang
中科院分区:
工程技术2区
文献类型:
--
作者:
Wang Daodang;Fu Xiangyu;Xu Ping;Tian Xiaobo;Spires Oliver;Liang Jian;Wu Heng;Liang Rongguang

文献摘要

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为了满足光学制造中在机测量的需要,提出了一种紧凑型快拍双模干涉测量系统,用于表面形状和粗糙度测量。为了简化表面形状和粗糙度之间的测量过程,引入了使用光学滤波器来分离参考臂中的光路的新概念。一个像素化的相机与微偏振器阵列同时获得四个π/2相移干涉图,以尽量减少环境干扰。此外,还引入了基于结构优化的子孔径拼接技术,扩展了可测孔径范围。数值分析和实验都证明了所提出的紧凑型快拍双模干涉仪的可行性。所提出的系统提供了一个强大的和便携式的工具,以实现在机器上的各种光学元件的表面特性在很宽的空间频率和孔径尺寸范围。
To meet the need of on-machine metrology in optical manufacturing, a compact and snapshot dual-mode interferometric system is proposed for surface shape and roughness measurement. To simplify the measurement process between surface shape and roughness, a novel concept of using optical filters to separate the beam paths in the reference arm is introduced. A pixelated camera with a micro-polarizer array acquires four pi/2 phase-shifted interferograms simultaneously to minimize the environmental disturbance. Besides, the configuration-optimization-based subaperture stitching technique is introduced to extend the measurable aperture range. Both numerical analysis and experiments have been carried out to demonstrate the feasibility of the proposed compact snapshot dual-mode interferometer. The proposed system provides a powerful and portable tool to achieve on-machine surface characterization of various optical elements over a wide range of spatial frequencies and aperture sizes.