Influences of substrate temperature on crystalline characteristics and mechanical properties of SiNx films deposited by microwave electron cyclotron resonance magnetron sputtering

Influences of substrate temperature on crystalline characteristics and mechanical properties of SiNx films deposited by microwave electron cyclotron resonance magnetron sputtering
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衬底温度对微波电子回旋共振磁控溅射SiNx薄膜晶体特性和力学性能的影响

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发表时间:
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期刊:
物理学报
影响因子:
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通讯作者:
Deng Xin-Lu
Deng Xin-Lu
中科院分区:
其他
文献类型:
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作者:
Ding Wan-Yu;Lu Wen-Qi;Xu jun;Dong Chuang;Deng Xin-Lu

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