Influences of substrate temperature on crystalline characteristics and mechanical properties of SiNx films deposited by microwave electron cyclotron resonance magnetron sputtering
Influences of substrate temperature on crystalline characteristics and mechanical properties of SiNx films deposited by microwave electron cyclotron resonance magnetron sputtering
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衬底温度对微波电子回旋共振磁控溅射SiNx薄膜晶体特性和力学性能的影响
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通讯作者:
Deng Xin-Lu
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作者:
Ding Wan-Yu;Lu Wen-Qi;Xu jun;Dong Chuang;Deng Xin-Lu