VACUUM-DEPOSITED GOLD-FILMS .1. FACTORS AFFECTING THE FILM MORPHOLOGY
VACUUM-DEPOSITED GOLD-FILMS .1. FACTORS AFFECTING THE FILM MORPHOLOGY
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DOI：
10.1016/0039-6028(92)90188-c
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发表时间：
1992-03-15
期刊：
影响因子：
1.9
通讯作者：
RUBINSTEIN, I
中科院分区：
文献类型：
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作者：
GOLAN, Y;MARGULIS, L;RUBINSTEIN, I
通过溅射或蒸发将薄（300-1000 埃）金膜沉积在玻璃、云母和硅基板（预热或保持在室温下）上。通过透射电子显微镜（TEM）、电子衍射（ED）和伏安测量对薄膜进行表征。金溅射产生的卵石型结构具有非常小的晶粒并且没有晶体结构。将金蒸发到玻璃或云母上会产生大而平坦的微晶，具有明显的 {111} 纹理，而在光滑的硅 (100) 上会产生无纹理的薄膜。在 250 摄氏度下对薄膜进行退火总是会产生晶粒增大的效果，并且对于玻璃或云母上的金来说，会增强 {111} 织构。
Thin (300-1000 angstrom) gold films were deposited on glass, mica and silicon substrates (preheated or held at room temperature) by sputtering or evaporation. The films were characterized by transmission electron microscopy (TEM), electron diffraction (ED) and voltammetric measurements. Gold sputtering produces pebble-type structures with very small grains and no crystallographic texture. Evaporation of gold onto glass or mica produces large, flat crystallites, with a pronounced {111} texture, while on smooth silicon (100) it results in non-textured films. Annealing of the films at 250-degrees-C always has the effect of grain enlargement, and, in the case of gold on glass or mica, enhancement of the {111} texture.