Resolution in New Nanofabrication Technique Combining Electron-Beam-Induced Deposition and Low-Energy Ion Milling
Resolution in New Nanofabrication Technique Combining Electron-Beam-Induced Deposition and Low-Energy Ion Milling
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结合电子束诱导沉积和低能离子铣削的新型纳米加工技术的分辨率
DOI：
10.1143/jjap.44.5627
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发表时间：
2005
期刊：
影响因子：
--
通讯作者：
K. Furuya
中科院分区：
文献类型：
--
作者：
K. Mitsuishi;M. Shimojo;Miyoko Tanaka;M. Takeguchi;K. Furuya
采用电子束诱导沉积（EBID）制备的薄膜作为掩膜进行低能离子铣削的纳米加工新技术，在不同的沉积时间沉积不同的掩膜，观察了离子铣削引起W掩膜和GaAs衬底的形状变化。根据这些结果，研究了制备的结构形状变化的时间演化，并确定了结构对掩膜尺寸的分辨率依赖性。W掩模具有较低的蚀刻速率，证明了其作为离子铣削掩模的有效性。该方法可制备直径小于10nm的纳米结构。
A new nanofabrication technique in which the deposits fabricated by electron-beam-induced deposition (EBID) are used as masks for low-energy ion milling was performed with various masks deposited at different deposition times, and the shape changes of the W mask and GaAs substrates caused by ion milling were observed. From these results, the time evolution of the shape change of the fabricated structures was studied, and the resolution dependence of the structure to the mask size was determined. The W mask showed a lower etch rate, proving its effectiveness as a mask for ion milling. Nanostructures less than 10 nm in diameter can be fabricated by this method.