DATA-ANALYSIS FOR SPECTROSCOPIC ELLIPSOMETRY
DATA-ANALYSIS FOR SPECTROSCOPIC ELLIPSOMETRY
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DOI：
10.1016/0040-6090(93)90298-4
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发表时间：
1993-10-25
期刊：
影响因子：
2.1
通讯作者：
JELLISON, GE
中科院分区：
文献类型：
--
作者：
JELLISON, GE
综述了椭偏光谱数据的建模，并将其分为三个阶段。第一阶段涉及计算给定层结构的菲涅耳反射系数；结果表明，阿贝尔形式提供了最大的灵活性，并且可以很容易地联系起来。对于涉及各向异性层的计算的Berreman形式化。第二阶段是参数化每一层的光学功能；评述了几种模型，包括有效介质、洛伦兹振荡器和最近非晶半导体的参数化。最后一阶段是将椭偏光谱数据拟合到模型中，讨论拟合函数的不同值。适当的数值分析技术要求使用简化后的chi2作为优值，这将导致数据点的适当加权，并获得有意义的误差限值和拟合优度的度量。
The modeling of spectroscopic ellipsometry data is reviewed, and is divided into three phases. The first phase involves the calculation of the Fresnel reflection coefficients for a given layer structure; it is shown that the Abeles formalism provides the most flexibility, and can be readily related. to the Berreman formalism for calculations involving anisotropic layers. The second phase is to parameterize the optical functions of each individual layer; several models are reviewed, including effective media, the Lorentz oscillator and a recent parameterization of amorphous semiconductors. The final phase involves the fitting of the spectroscopic ellipsometry data to the model, where different figures of merit of the fitting function are discussed. A proper numerical analysis technique requires that the reduced chi2 be used as the figure of merit, which will result in the proper weighting of data points, and in obtaining meaningful error limits and a measure of the goodness of fit.