Influence of Laser Plasma Soft X-Ray Irradiation on Crystallization of a-Si Film by Infrared Annealing
Influence of Laser Plasma Soft X-Ray Irradiation on Crystallization of a-Si Film by Infrared Annealing
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激光等离子体软X射线照射对非晶硅薄膜红外退火晶化的影响
DOI:
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发表时间:
2010
期刊:
影响因子:
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通讯作者:
and Naoya Kawamoto
中科院分区:
文献类型:
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作者:
Naoto Matsuo;Nobuya Isoda;Akira Heya;Sho Amano;Shuji Miyamoto;Takayasu Mochizuki;and Naoya Kawamoto