Localized etching of an insulator film coated on a copper wire using an atmospheric-pressure microplasma jet.
Localized etching of an insulator film coated on a copper wire using an atmospheric-pressure microplasma jet.
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DOI：
10.1063/1.2727488
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发表时间：
2007-04
期刊：
影响因子：
--
通讯作者：
H. Yoshiki
中科院分区：
文献类型：
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作者：
H. Yoshiki
Ar和ArO(2)气体的大气压微等离子体射流(APmicroPJ)由外径为0.4 mm和内径为0.2 mm的不锈钢外科针尖产生，射频激励频率为13.56 MHz。钢针既有动力电极的作用，也有气体喷嘴的作用。工作功率为1.2-6W，对应的峰间电压为Vp.p。大约是1.5千伏。利用APmicroPJ对直径为90微米的铜绕组线的聚酰胺-酰亚胺绝缘膜(厚度为10微米)进行了局部刻蚀。铜线周围的绝缘膜被辐照的等离子体从一定方向完全去除，而不熔断铜线。在射频功率为4W的Ar APmicroPJ辐照下，去除时间仅为3 S。荧光显微镜和扫描电子显微镜图像显示，绝缘膜对铜线具有良好的选择性。在O(2)浓度为10%或更高的ArO(2)APmicroPJ辐照条件下，去除的铜表面转化为氧化铜CuO。
Atmospheric-pressure microplasma jets (APmicroPJs) of Ar and ArO(2) gases were generated from the tip of a stainless steel surgical needle having outer and inner diameters of 0.4 and 0.2 mm, respectively, with a rf excitation of 13.56 MHz. The steel needle functions both as a powered electrode and a gas nozzle. The operating power is 1.2-6 W and the corresponding peak-to-peak voltage Vp.p. is about 1.5 kV. The APmicroPJ was applied to the localized etching of a polyamide-imide insulator film (thickness of 10 microm) of a copper winding wire of 90 microm diameter. The insulator film around the copper wire was completely removed by the irradiated plasma from a certain direction without fusing the wire. The removal time under the Ar APmicroPJ irradiation was only 3 s at a rf power of 4 W. Fluorescence microscopy and scanning electron microscope images reveal that good selectivity of the insulator film to the copper wire was achieved. In the case of ArO(2) APmicroPJ irradiation with an O(2) concentration of 10% or more, the removed copper surface was converted to copper monoxide CuO.