Stress Writing Textured Graphite Conducting Wires/Patterns in Insulating Amorphous Carbon Matrix as Interconnects.

Stress Writing Textured Graphite Conducting Wires/Patterns in Insulating Amorphous Carbon Matrix as Interconnects.
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压力写入纹理的石墨导电/图案,以绝缘无定形碳基质作为互连。

DOI:
10.1038/s41598-017-10294-1
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发表时间:
2017-08-29
期刊:
影响因子:
4.6
通讯作者:
Lai HJ
Lai HJ
中科院分区:
综合性期刊3区
文献类型:
--
作者:
Wang DS;Chang SY;Chen TS;Chou TH;Huang YC;Wu JB;Leu MS;Lai HJ

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本研究报告了一种基于机械应力的技术,该技术涉及在绝缘无定形碳基质中刮擦或压印以写入纹理化石墨导线/图案,以潜在地用作未来碳质电路中的互连。在低于无定形碳的热石墨化所需的温度的低能量后退火的情况下,仅在机械应力区域中的无定形碳相转变成具有420 μΩ-cm的低电阻率的良好对准的结晶石墨结构,而周围的无定形碳基质保持绝缘。具有明显石墨峰的显微拉曼光谱和清晰石墨晶格的高分辨率透射电子显微镜观察证实了无定形碳向织构石墨的局部相变正好发生在应力区域。应力诱导的碳键重构以产生取向的石墨核被认为有助于在低温后退火期间织构化石墨的伪自形成。
This study reports a mechanical stress-based technique that involves scratching or imprinting to write textured graphite conducting wires/patterns in an insulating amorphous carbon matrix for potential use as interconnects in future carbonaceous circuits. With low-energy post-annealing below the temperature that is required for the thermal graphitization of amorphous carbon, the amorphous carbon phase only in the mechanically stressed regions transforms into a well aligned crystalline graphite structure with a low electrical resistivity of 420 μΩ-cm, while the surrounding amorphous carbon matrix remains insulating. Micro-Raman spectra with obvious graphitic peaks and high-resolution transmission electron microscopic observations of clear graphitic lattice verified the localized phase transformation of amorphous carbon into textured graphite exactly in the stressed regions. The stress-induced reconstruction of carbon bonds to generate oriented graphitic nuclei is believed to assist in the pseudo-self-formation of textured graphite during low-temperature post annealing.
DOI: 10.1103/physrevb.61.14095
发表时间: 2000-05-15
期刊: PHYSICAL REVIEW B
影响因子: 3.7
作者:
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通讯作者: Robertson, J
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发表时间: 2001-02-01
影响因子: 4.1
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