Hybrid approaches to nanolithography: Photolithographic structures with precise, controllable nanometer-scale spacings created by molecular rulers
Hybrid approaches to nanolithography: Photolithographic structures with precise, controllable nanometer-scale spacings created by molecular rulers
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DOI：
10.1002/adma.200600108
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发表时间：
2006-04-18
影响因子：
29.4
通讯作者：
Weiss, PS
中科院分区：
文献类型：
--
作者：
Anderson, ME;Mihok, M;Weiss, PS
纳米光刻的混合方法将传统光刻与化学自组装相结合，以产生具有定制纳米级间距的对齐微结构（见图）。自组装多层膜形成精确的抗蚀剂，以产生具有纳米级器件制造所需的受控取向和尺寸的分层纳米结构。
A hybrid approach to nanolithography combines conventional lithography with chemical self-assembly to yield aligned microstructures with tailored nanoscale spacings (see figure). Self-assembled multilayers form precise resists to create hierarchical nanostructures with the controlled orientation and dimensions necessary for nanoscale device fabrication.