Evaluation of the fluorinated antisticking layer by using photoemission and NEXAFS spectroscopies
Evaluation of the fluorinated antisticking layer by using photoemission and NEXAFS spectroscopies
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使用光电发射和 NEXAFS 光谱评估氟化防粘层
DOI：
10.1007/s00339-015-9104-5
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发表时间：
2015
期刊：
影响因子：
--
通讯作者：
Shinji Matsui
中科院分区：
文献类型：
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作者：
Yuichi Haruyama;Yasuki Nakai;Shinji Matsui
利用光电子能谱和近边X射线吸收精细结构谱（NEXAFS）研究了4种不同链长的氟化自组装膜（F-SAMs）的电子结构，并将其作为防粘层材料.从光电子能谱中的宽和在C1分数水平的区域，具有不同的链长的F-SAMs的化学组成和组成进行了评估。通过对C1分数能级区的光电子能谱进行曲线拟合分析，发现F-SAM的C位中，CF 3位位于表面的顶部.从F-SAMs的C K边NEXAFS谱作为激发光子入射角的函数，表明F-SAMs中的σ*（C-F）和σ*（C-C）轨道分别平行和垂直于表面。这表明F-SAMs的（CF 2）n部分中的C-C链垂直于表面。在此基础上，对F-SAMs的电子结构进行了讨论。
The electronic structures of four kinds of fluorinated self-assembled monolayers (F-SAMs) with different chain length, which were used for an antisticking layer, were investigated by the photoemission and the near-edge X-ray absorption fine structure (NEXAFS) spectroscopies. From the photoemission spectra in the wide and in the C 1score-level regions, chemical compositions and components of the F-SAMs with different chain length were evaluated. By using the curve fitting analysis of the photoemission spectra in C 1score-level region, it was found that the CF3site is located at the top of the surface in the C sites of the F-SAM. From the C K-edge NEXAFS spectra of the F-SAMs as a function of the incidence angle of the excitation photon, it was shown that theσ*(C–F) andσ*(C–C) orbitals in the F-SAMs are parallel and perpendicular to the surface, respectively. This indicates that the C–C chain in (CF2)npart of the F-SAMs is perpendicular to the surface. Based on these results, the electronic structures of the F-SAMs are discussed.