Initiated and oxidative chemical vapor deposition: a scalable method for conformal and functional polymer films on real substrates
Initiated and oxidative chemical vapor deposition: a scalable method for conformal and functional polymer films on real substrates
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DOI：
10.1039/b900455f
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发表时间：
2009-01-01
影响因子：
3.3
通讯作者：
Gleason, Karen K.
中科院分区：
文献类型：
--
作者：
Baxamusa, Salmaan H.;Im, Sung Gap;Gleason, Karen K.
化学气相沉积（CVD）是一种广泛使用的技术，用于制备具有系统可调性能的保形且无缺陷的无机薄膜。聚合物是一类理想的表面改性材料。阳离子因其低成本、广泛的化学和物理功能以及机械灵活性。引发和氧化化学气相沉积（iCVD 和 oCVD）是聚合物 CVD 方法，它将 CVD 处理的优点与聚合物材料的可能性结合起来。利用这些技术，我们的实验室合成了许多功能性、生物相容性和导电聚合物，作为微米和纳米结构表面上的薄膜。本视角将回顾这些领域的最新进展，并重点介绍利用 iCVD 和 oCVD 聚合物的设备和应用。
Chemical vapor deposition (CVD) is a widely-used technology for the preparation of conformal and defect-free inorganic thin films with systematically tunable properties. Polymers are a desirable class of materials for surface modi. cation because of their low cost, wide array of chemical and physical functionality and mechanical flexibility. Initiated and oxidative chemical vapor deposition (iCVD and oCVD) are polymer CVD methods that combine the benefits of CVD processing with the possibilities of polymeric materials. Using these technologies, our laboratory has synthesized a number of functional, biocompatible and electrically conducting polymers as thin films on micro- and nano-structured surfaces. This Perspective will review recent advances in these areas and highlight devices and applications that utilize iCVD and oCVD polymers.