Comparative study of solution-phase and vapor-phase deposition of aminosilanes on silicon dioxide surfaces.

Comparative study of solution-phase and vapor-phase deposition of aminosilanes on silicon dioxide surfaces.
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DOI:
10.1016/j.msec.2013.11.017
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发表时间:
2014-02-01
期刊:
Materials science & engineering. C, Materials for biological applications
影响因子:
--
通讯作者:
Miller BL
Miller BL
中科院分区:
其他
文献类型:
--
作者:
Yadav AR;Sriram R;Carter JA;Miller BL

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氨基硅烷层的均匀性通常用于羟基承载表面如二氧化硅的改性,对于包括生物传感器在内的各种应用是至关重要的。然而,尽管已经进行了许多研究,表面硅烷化,仍然是一个稀缺的易于实施的沉积方法可重复地产生光滑的氨基硅烷单层。在这项研究中,溶液和气相沉积方法的三个氨基烷氧基硅烷不同的反应基团(3-氨丙基三乙氧基硅烷(APTES),3-氨丙基甲基二乙氧基硅烷(APMDES)和3-氨丙基二甲基乙氧基硅烷(APDMES))的数量进行了评估,目的是确定方法,产生高度均匀和可重复的硅烷层,耐微小的程序变化。硅烷膜的质量,其特征在于基于测量的厚度,亲水性和表面粗糙度。此外,通过在水中解吸后的这些厚度和接触角值评估膜的水解稳定性。我们发现,两个简单的溶液相的方法,APTES的水沉积和基于甲苯的沉积的APDMES,产生高品质的硅烷层,表现出可比的特性,通过气相方法沉积的那些。
The uniformity of aminosilane layers typically used for the modification of hydroxyl bearing surfaces such as silicon dioxide is critical for a wide variety of applications, including biosensors. However, in spite of many studies that have been undertaken on surface silanization, there remains a paucity of easy-to-implement deposition methods reproducibly yielding smooth aminosilane monolayers. In this study, solution- and vapor-phase deposition methods for three aminoalkoxysilanes differing in the number of reactive groups (3-aminopropyl triethoxysilane (APTES), 3-aminopropyl methyl diethoxysilane (APMDES) and 3-aminopropyl dimethyl ethoxysilane (APDMES)) were assessed with the aim of identifying methods that yield highly uniform and reproducible silane layers that are resistant to minor procedural variations. Silane film quality was characterized based on measured thickness, hydrophilicity and surface roughness. Additionally, hydrolytic stability of the films was assessed via these thickness and contact angle values following desorption in water. We found that two simple solution-phase methods, an aqueous deposition of APTES and a toluene based deposition of APDMES, yielded high quality silane layers that exhibit comparable characteristics to those deposited via vapor-phase methods.