Very fast biaxial texture evolution using high rate ion-beam-assisted deposition of MgO
Very fast biaxial texture evolution using high rate ion-beam-assisted deposition of MgO
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DOI：
10.1557/jmr.2009.0036
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发表时间：
2009-01-01
影响因子：
2.7
通讯作者：
Gueth, Konrad
中科院分区：
文献类型：
--
作者：
Matias, Vladimir;Haenisch, Jens;Gueth, Konrad
我们研究了离子束辅助沉积（IBAD）过程中MgO薄膜的晶体织构演变。我们首次证明了MgO的IBAD中的平面内晶体织构与沉积速率有关。在高离子电流下，可在不到1 s的时间内实现面内织构半最大宽度达到10度，在2.2 s内达到6度，MgO织构随着表面沉积的同外延层厚度的增加而进一步改善。我们已经开发了IBAD和同外延层的织构演变的经验量化。迄今为止，在MgO层油抛光哈氏合金带中获得的最佳织构具有1.6度的平面内FWHM。这里展示的高沉积速率使IBAD纹理模板的高通量制造成为一个实用且具有成本效益的概念。
We examined crystalline-texture evolution during ion-beam-assisted deposition (IBAD) of MgO thin films. We have demonstrated for the first time that in-plane crystalline texturing in IBAD of MgO scales with deposition rate. At high ion currents an in-plane texture full width at half-maximum (FWHM) of 10 degrees can be achieved in less than 1 s, and 6 degrees in 2.2 S. MgO texture further improves with thickness of a homoepitaxial layer deposited on top. We have developed an empirical quantification of the texture evolution in both IBAD and homoepitaxial layers. The best texture attained thus far in the MgO layer oil polished Hastelloy tape has ail in-plane FWHM of 1.6 degrees. The high deposition rates demonstrated here make high-throughput manufacturing of IBAD textured templates a practical and cost-effective concept.