Room-temperature imprint lithography by solvent vapor treatment
Room-temperature imprint lithography by solvent vapor treatment
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DOI：
10.1063/1.125613
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发表时间：
2000-02
影响因子：
4
通讯作者：
D. Khang;H. Lee
中科院分区：
文献类型：
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作者：
D. Khang;H. Lee
我们展示了室温纳米压印光刻使用溶剂蒸气处理的聚合物薄膜在基板上。在该方法中，用溶剂蒸气处理的膜在室温下用模具压制，不需要光刻所需的加热。我们表明，模具或掩模图案低至60 nm，可以很好地转移到聚合物膜上，而没有任何问题的聚合物粘附到模具。干燥的聚合物膜的蒸气处理导致粘度和玻璃化转变温度降低，从而允许室温光刻。这种室温压印应该使压印光刻术更有价值的实际应用。
We demonstrate room-temperature nanoimprint lithography using solvent vapor treatment of the polymer film on a substrate. In this method, the film treated with the solvent vapor is pressed with a mold at room temperature, requiring no heating that has been needed for the lithography. We show that the mold or mask patterns down to 60 nm can well be transferred onto the polymer film without any problem of the polymer adhering to the mold. The vapor treatment of the dried polymer film results in lowering both the viscosity and the glass transition temperature, thereby allowing for the room-temperature lithography. This room-temperature imprinting should make the imprint lithography more valuable for practical applications.