A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist
A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist
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一种可水浇注、可水显影的化学放大负色调光刻胶
DOI：
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发表时间：
1997
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通讯作者：
J. Fréchet
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文献类型：
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作者：
Q. Lin;Thomas Steinhäusler;L. Simpson;Michelle Wilder;D. Medeiros;C. Willson;J. M. Havard;J. Fréchet
本文介绍了一种“环境友好”的、可水浇铸的、可水显影的光致抗蚀剂体系。化学放大负性抗蚀剂系统由三种水溶性组分组成：聚合物，聚（甲基丙烯酰胺基乙醇酸酯甲基醚），[聚（MAGME）];光酸产生剂，（2，4-二羟基苯基）二甲基锍三氟甲磺酸盐，和交联剂，1，4-丁二醇。在三组分抗蚀剂体系中，通过光酸产生剂的光解产生的酸催化在曝光后烘烤期间曝光区域中的聚（MAGME）的交联，从而使曝光区域不溶于水。负色调浮雕图像通过用纯水显影而获得。该抗蚀剂能够分辨1 μm线/空间特征（1：1纵横比），深紫外曝光剂量为100 mJ/cm 2（印刷剂量）。该抗蚀剂可用于使用过硫酸钠水溶液作为蚀刻剂在印刷电路板上产生蚀刻的铜浮雕图像。并对交联机理进行了探讨。
This paper describes an “environmentally friendly”, water-castable, water-developable photoresist system. The chemically amplified negative-tone resist system consists of three water-soluble components: a polymer, poly(methyl acrylamidoglycolate methyl ether), [poly(MAGME)]; a photoacid generator, (2,4-dihydroxyphenyl)dimethylsulfonium triflate, and a cross-linker, 1,4-butanediol. In the three-component resist system, the acid generated by photolysis of the photoacid generator catalyzes the cross-linking of poly(MAGME) in the exposed regions during postexposure baking, thus rendering the exposed regions insoluble in water. Negative-tone relief images are obtained by developing with pure water. The resist is able to resolve 1 μm line/space features (1:1 aspect ratio) with a deep-UV exposure dose of 100 mJ/cm2 (dose to print). The resist can be used to generate etched copper relief images on printed circuit boards using aqueous sodium persulfate as the etchant. The mechanism of cross-linking has been inves...