Edge-On MoS2 Thin Films by Atomic Layer Deposition for Understanding the Interplay between the Active Area and Hydrogen Evolution Reaction
Edge-On MoS2 Thin Films by Atomic Layer Deposition for Understanding the Interplay between the Active Area and Hydrogen Evolution Reaction
复制标题
DOI：
10.1021/acs.chemmater.7b03212
复制
发表时间：
2017-08
影响因子：
8.6
通讯作者：
Thi Anh Ho;Changdeuck Bae;Seonhee Lee;Myungjun Kim;J. M. Montero-Moreno;J. Park;Hyunjung Shin
中科院分区：
文献类型：
--
作者：
Thi Anh Ho;Changdeuck Bae;Seonhee Lee;Myungjun Kim;J. M. Montero-Moreno;J. Park;Hyunjung Shin
二硫化钼(MoS_2)的边缘中心是析氢反应(HER)的有效电催化剂。为了利用这些结构，已经提出了两个主要策略。第一种策略是使用非晶态结构，这将有利于最大化MoS_2的边缘位置部分的面积。然而，在HER期间，这些结构经历了结构不稳定。另一种策略是纳米结构，在这种结构中，为了提高最终的性能，MoS2的暴露表面不能是惰性基面。因此，MoS2可能需要临界纳米结晶度才能产生所需的小平面。这里，我们首先描述了当原子层沉积(ALD)应用于层状材料如MoS_2时，MoS_2在平面上呈现出原子层沉积的非理想模式。作为模型体系，研究了MoCl5和H_2S的ALD反应。这种非理想性不允许生长厚度与循环次数之间的传统线性关系。相反，它..。
The edge sites of molybdenum disulfide (MoS2) have been shown to be efficient electrocatalysts for the hydrogen evolution reaction (HER). To utilize these structures, two main strategies have been proposed. The first strategy is to use amorphous structures, which should be beneficial in maximizing the area of the edge-site moieties of MoS2. However, these structures experience structural instability during HER. The other strategy is nanostructuring, in which, to enhance the resulting HER performance, the exposed surfaces of MoS2 cannot be inert basal planes. Therefore, MoS2 may need critical nanocrystallinity to produce the desired facets. Here, we first describe that when atomic layer deposition (ALD) is applied to layered materials such as MoS2, MoS2 exhibits the nonideal mode of ALD growth on planar surfaces. As a model system, the ALD of MoCl5 and H2S was studied. This nonideality does not allow for the conventional linear relationship between the growth thickness and the number of cycles. Instead, it...