Tetsuya Goto: "A New Microwave-Excited Plasma Etching Equipment for Separated Plasma Excited Region from Etching Process Region"Extended Abstracts of the 2002 International Conference on Solid State Devices and Materials. 444-445 (2002)
Tetsuya Goto: "A New Microwave-Excited Plasma Etching Equipment for Separated Plasma Excited Region from Etching Process Region"Extended Abstracts of the 2002 International Conference on Solid State Devices and Materials. 444-445 (2002)
复制标题
Tetsuya Goto：“用于将等离子体激发区域与蚀刻处理区域分离的新型微波激发等离子体蚀刻设备”2002 年国际固态器件和材料会议的扩展摘要。
DOI：
--
复制
发表时间：
--
期刊：
影响因子：
--
通讯作者：
中科院分区：
文献类型：
--
作者：
