Spin textures in synthetic antiferromagnets: Challenges, opportunities, and future directions
Spin textures in synthetic antiferromagnets: Challenges, opportunities, and future directions
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DOI：
10.1063/5.0153349
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发表时间：
2023-06
期刊：
影响因子：
6.1
通讯作者：
Kang Wang;Vineetha Bheemarasetty;Gang Xiao
中科院分区：
文献类型：
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作者：
Kang Wang;Vineetha Bheemarasetty;Gang Xiao
自旋纹理，如磁畴壁和skyrmions，有可能通过编码信息比特来彻底改变电子设备。虽然铁磁薄膜的最新进展已经带来了有前途的器件原型，但其广泛实施受到材料相关缺点的阻碍。然而，反铁磁自旋纹理为许多这些限制提供了解决方案，为更快，更小，更节能，更强大的电子产品铺平了道路。合成反铁磁体的功能，由两个或更多个磁性层分隔的间隔，可以很容易地操纵，通过使用不同的材料以及接口工程。在这篇透视文章中，我们研究了合成反铁磁体中自旋织构所带来的挑战和机遇，并为这一新兴领域的未来研究提出了可能的方向和前景。
Spin textures, such as magnetic domain walls and skyrmions, have the potential to revolutionize electronic devices by encoding information bits. Although recent advancements in ferromagnetic films have led to promising device prototypes, their widespread implementation has been hindered by material-related drawbacks. Antiferromagnetic spin textures, however, offer a solution to many of these limitations, paving the way for faster, smaller, more energy-efficient, and more robust electronics. The functionality of synthetic antiferromagnets, comprised of two or more magnetic layers separated by spacers, may be easily manipulated by making use of different materials as well as interface engineering. In this Perspective article, we examine the challenges and opportunities presented by spin textures in synthetic antiferromagnets and propose possible directions and prospects for future research in this burgeoning field.