Fabrication of the nanofluidic channels type leak assembly based on the glass frit sealing method
Fabrication of the nanofluidic channels type leak assembly based on the glass frit sealing method
复制标题
基于玻璃熔块密封法的纳米流体通道型泄漏组件的制作
DOI：
10.1116/1.5119842
复制
发表时间：
2019-09-01
影响因子：
1.4
通讯作者：
Wei, Wei
中科院分区：
文献类型：
--
作者：
Zhou, Wentian;Bi, Hailin;Wei, Wei
通常采用Torr-Seal粘接方法将纳米碎屑泄漏元件粘接到真空系统上。然而，由于Torr-Seal的强烈放气作用，这种新的泄漏很难在超高真空中应用。为了消除这一问题，实现泄漏元件和CF法兰的封闭密封，在玻璃熔块密封方法的基础上，研制了一种新型的纳米流道式泄漏组件。利用反应离子刻蚀和硅直接键合工艺，将特征尺寸为∼162 nm的纳米流体通道封闭为泄漏元件。用残余气体分析仪分析了泄漏组件的放气率。结果表明，玻璃浆料的放气率比Torr-Seal低一个数量级。用差分法测定了氦气、氮气和氩气的流动电导。结果表明，计算值与实测值基本吻合，分子流动是从真空到常压的，通常采用Torr-Seal胶粘法将纳米级的泄漏元件粘接到真空系统上。然而，由于Torr-Seal的强烈放气作用，这种新的泄漏很难在超高真空中应用。为了消除这一问题，实现泄漏元件和CF法兰的封闭密封，在玻璃熔块密封方法的基础上，研制了一种新型的纳米流道式泄漏组件。利用反应离子刻蚀和硅直接键合工艺，将特征尺寸为∼162 nm的纳米流体通道封闭为泄漏元件。用残余气体分析仪分析了泄漏组件的放气率。结果表明，玻璃浆料的放气率比Torr-Seal低一个数量级。用差分法测定了氦气、氮气和氩气的流动电导。结果表明，实测值与计算值接近，分子流动是从真空到常压。
The Torr-Seal gluing method was often used to attach the nanofabricated leak elements to the vacuum system. However, such new leaks are difficult to be applied in ultrahigh vacuum due to the strong outgassing effect of Torr-Seal. To eliminate such issue and achieve enclosed sealing of leak element and CF flange, a new nanofluidic channels type leak assembly has been fabricated based on the glass frit sealing method. Nanofluidic channels with a feature dimension of ∼162 nm were enclosed as a leak element using reactive ion etching and silicon direct bonding processes. The outgassing rate of the leak assembly was analyzed by a residual gas analyzer. The results exhibit that the outgassing rate with the glass paste is 1 order of magnitude lower than that with the Torr-Seal. The flow conductance of helium, nitrogen, and argon was characterized by the difference method. It is found that the measured values are close to the calculated values and the molecular flow is achieved from vacuum to atmosphere pressure.The Torr-Seal gluing method was often used to attach the nanofabricated leak elements to the vacuum system. However, such new leaks are difficult to be applied in ultrahigh vacuum due to the strong outgassing effect of Torr-Seal. To eliminate such issue and achieve enclosed sealing of leak element and CF flange, a new nanofluidic channels type leak assembly has been fabricated based on the glass frit sealing method. Nanofluidic channels with a feature dimension of ∼162 nm were enclosed as a leak element using reactive ion etching and silicon direct bonding processes. The outgassing rate of the leak assembly was analyzed by a residual gas analyzer. The results exhibit that the outgassing rate with the glass paste is 1 order of magnitude lower than that with the Torr-Seal. The flow conductance of helium, nitrogen, and argon was characterized by the difference method. It is found that the measured values are close to the calculated values and the molecular flow is achieved from vacuum to atmosphere pressure.