Effects of silicon content on the structure and properties of (AlCrMoTaTi)N coatings by reactive magnetron sputtering
Effects of silicon content on the structure and properties of (AlCrMoTaTi)N coatings by reactive magnetron sputtering
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DOI：
10.1016/j.jallcom.2014.07.095
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发表时间：
2014-12
影响因子：
6.2
通讯作者：
Du-Cheng Tsai;Z. Chang;Bing-Hau Kuo;Shou-Yi Chang;F. Shieu
中科院分区：
文献类型：
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作者：
Du-Cheng Tsai;Z. Chang;Bing-Hau Kuo;Shou-Yi Chang;F. Shieu
在N2/Ar气氛下，采用射频磁控溅射AlCrMoTaTi合金靶，在Si基片上制备了Si掺杂（AlCrMoTaTi）N涂层。研究了不同硅靶功率下薄膜的晶体结构、显微结构、力学性能和电学性能。当Si含量达到7.51原子%时，保留了氮化物的简单NaCl型面心立方结构。在氮化物涂层中观察到显著的晶格衰退和晶粒生长。涂层的微观结构由表面粗糙的疏松柱状体转变为表面光滑的致密圆顶状。溶解度约为7.51 at.% Si含量被证明。Si的掺入显著提高了涂层的机械性能，但降低了它们的电性能。涂层的硬度从20.7 GPa增加到35.5 GPa，电阻率从793 μΩ cm增加到3872 μΩ cm。
Si-doped (AlCrMoTaTi)N coatings were deposited onto an Si substrate by radio-frequency magnetron sputtering of an AlCrMoTaTi alloy target under direct current bias in an N2/Ar atmosphere. The crystal, microstructural, mechanical, and electrical properties at different Si-target powers were investigated. As the Si content reached 7.51 at.%, the simple NaCl-type face-centered cubic structure of nitride was retained. Significant lattice decline and grain growth were observed in the nitride coatings. The microstructure of coatings transformed from loose columns with rough-faceted surface into dense ones with smooth-domed surface. The solubility of approximately 7.51 at.% Si content was demonstrated. Si incorporation significantly improved the mechanical properties of the coatings, but degraded their electrical properties. The hardness of the coatings increased from 20.7 GPa to 35.5 GPa, and the electrical resistivity increased from 793 μΩ cm to 3872 μΩ cm.