Secondary ion emission from polymer surfaces under Ar+, Xe+ and SF5+ ion bombardment
Secondary ion emission from polymer surfaces under Ar+, Xe+ and SF5+ ion bombardment
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DOI：
10.1016/s0169-4332(97)00515-1
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发表时间：
1998-05-01
影响因子：
6.7
通讯作者：
Benninghoven, A
中科院分区：
文献类型：
--
作者：
Kotter, F;Benninghoven, A
我们研究了 10 keV Ar+、Xe+ 和 SF5+ 轰击下聚合物表面的特征分子二次离子发射。 PET、PP、PTFE、PS、PC、PMMA 和 PEG 的二次离子产率在静态 SIMS 条件下测定。测量了 PS 和 PC 的损伤截面。我们应用了飞行时间质谱仪，配备脉冲 EI 源，允许应用质量分离的初级离子束。旋涂多层以及本体聚合物的表面已经被研究。从 Ar+ 改为 Xe+ 和 SF5+ 轰击，我们发现特征分子二次离子的产率 Y 显着增加（高达 1000 倍），而相应的损伤截面 sigma 的增加要小得多（高达 6 倍）。这两种效应在高质量范围内更加明显。二次离子形成效率的相应提高范围在 5 至 50 倍之间，具体取决于聚合物种类、样品制备和质量范围。 Ag 和 Si 上单分子覆盖层的初步结果表明，它们的二次离子发射特征具有相似的行为。 (C) 1998 Elsevier Science B.V. 保留所有权利。
We investigated the characteristic molecular secondary ion emission from polymer surfaces under 10 keV Ar+, Xe+ and SF5+ bombardment. Secondary ion yields of PET, PP, PTFE, PS, PC, PMMA and PEG were determined under static SIMS conditions. Damage cross sections were measured for PS and PC. We applied a time-of-flight mass spectrometer, equipped with a pulsed EI-source allowing the application of mass separated primary ion beams. Spin coated multilayers as well as surfaces of bulk polymers have been studied. Changing from Ar+ to Xe+ and to SF5+ bombardment we found a strong increase of the yield Y (up to a factor of 1000) and a much smaller increase in the corresponding damage cross sections sigma (up to a factor of 6) for characteristic molecular secondary ions. Both effects are more pronounced in the high mass range. The corresponding increases in secondary ion formation efficiencies ranges between a factor of 5 and 50, depending on the polymer species, the sample preparation and the mass range. Preliminary results for monomolecular overlayers on Ag and Si indicate a similar behaviour of their characteristic secondary ion emission. (C) 1998 Elsevier Science B.V. All rights reserved.