Structure and magnetic properties for L10-ordered FeNi films prepared by alternate monatomic layer deposition
Structure and magnetic properties for L10-ordered FeNi films prepared by alternate monatomic layer deposition
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DOI：
10.1016/j.jmmm.2006.10.799
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发表时间：
2007-03-01
影响因子：
2.7
通讯作者：
Takanashi, K.
中科院分区：
文献类型：
--
作者：
Shima, T.;Okamura, M.;Takanashi, K.
交替单原子层 (ML) 沉积技术已用于制造 FeNi 合金的亚稳态 L1(0) 有序相。通过在 80 至 400 ℃ 范围内的不同温度 T-S 下，在 MgO (0 0 1) 基底上交替沉积 Fe (0 0 1) 和 Ni (0 0 1) ML 来制备薄膜。发现，通过 X 射线衍射评估的长程有序度 S 的程度随着 T-S 的增加而增加，并在 T-S = 240 ℃时达到最大值。随着 T-S 的进一步增加，S 表现出急剧的下降，几乎消失在 TS=280℃。280℃接近热平衡时的有序-无序转变温度。 K-u 的变化趋势与 S 相同，表明在 T-S = 200-260 摄氏度范围内形成了 L1(0) 有序 FeNi 合金。在 T-S = 240 摄氏度时获得了 S = 0.6 +/- 0.2 和 K-u = 6.3 x 10(6) (erg/cm(3)) 的最大值。 (c) 2006 Elsevier B.V.保留所有权利。
Alternate monatomic layer (ML) deposition technique has been used to fabricate a metastable L1(0)-ordered phase of FeNi alloys. The films were prepared by alternating Fe (0 0 1) and Ni (0 0 1) MLs on MgO (0 0 1) substrates at various temperatures T-S in the range between 80 and 400 degrees C. It has been found that the degree of long-range order S evaluated by X-ray diffraction increases with T-S, and it has a maximum at T-S = 240 degrees C. With further increase of T-S, S shows a drastic decrease, and almost disappears at TS = 280 degrees C. 280 degrees C is close to the order-disorder transformation temperature in the thermal equilibrium. The variation of K-u shows the same tendency as that of S, suggesting the formation of L1(0)-ordered FeNi alloy in the range of T-S = 200-260 degrees C. Maximum values of S = 0.6 +/- 0.2 and K-u = 6.3 x 10(6) (erg/cm(3)) are obtained at T-S = 240 degrees C. (c) 2006 Elsevier B.V. All rights reserved.